Niobium flat target is a circular or rectangular target material with a certain thickness, mainly used in the sputtering coating process. In sputtering coating technology, niobium flat targets are used as cathode sputtering targets to deposit niobium atoms in the form of oxides on the substrate material through the sputtering process, achieving coating. The performance of this target material has a decisive impact on the stability of the sputtering coating process and the electrical properties of the film. Niobium flat target material is usually referred to as a bare target, which needs to be welded to a copper back target before use, and then sputtered on a dedicated machine to ensure the quality and stability of the sputtered coating. In addition, niobium flat target materials are widely used in optical glass, flat display industry, architectural glass coating industry, thin film photovoltaic solar cell electrode film system and other fields, demonstrating their important role in modern industrial and technological applications.
