1、 The concept of target material
Target material, also known as sputtering target material, refers to the substance sputtered during the sputtering coating process. Sputtering is a material deposition method that accelerates charged particles (ions) to collide with the surface of a target material, "stripping" atoms or molecules from the surface of the target material, and then depositing them onto the substrate surface to form a thin film. The selection and quality of target materials have a crucial impact on the performance of thin films.
2、 Types of target materials
According to different classification methods, target materials can be classified into multiple types.
Classified by material type: metal target, alloy target, ceramic target, composite target, etc.
Classified by purity: high-purity target material, ultra-high purity target material, etc.
Classified by purpose: optical thin film target, magnetic thin film target, conductive thin film target, etc.
3、 Application of Target Materials
Target materials are widely used in many fields, such as:
Display field: such as liquid crystal displays (LCD), organic light-emitting diodes (OLED), etc.
Solar cells: such as silicon-based, thin-film solar cells, etc.
Magnetic storage: such as hard drives, magnetic cards, etc.
Microelectronics devices: such as integrated circuits, semiconductor devices, etc.
Optical components: such as mirrors, filters, etc.
Biomedical: such as biosensors, drug release control, etc.
4、 Preparation method of target material
The preparation methods of target materials mainly include the following:
Melting casting method: Heating metal or alloy materials to a molten state, then casting, cooling, and demolding to obtain the target material.
Hot pressing method: Apply pressure to powdered raw materials at high temperatures to melt and shape them.
Sintering method: Powder like raw materials are formed and sintered at high temperatures to form target materials with certain strength and shape
Sputtering method: Using sputtering technology to sputter raw materials onto the surface of another target material, forming the desired thin film target material.
Chemical Vapor Deposition (CVD): Deposition of desired materials on the surface of a target material through chemical reactions.
Electrolysis method: Using current to pass through a solution, metal ions in the solution are deposited on the anode to form a target material.
5、 Summary
Titanium targets, as the material sputtered during the sputtering process, have a wide variety of types and applications, covering multiple fields such as displays, solar cells, magnetic storage, microelectronic devices, optical components, etc. The quality of the target material has a significant impact on the performance of the thin film, so it is crucial to choose the appropriate target material and preparation method. In the future development of technology, target material technology will continue to play an important role in promoting continuous innovation and breakthroughs in various fields of technology.
