1、 Copper tube target purity level and core application scenarios

1. 4N level (99.99%)

Application: Semiconductor lead frame, high conductivity material.

Features: Total impurity content ≤ 100ppm, suitable for industrial scenarios with less stringent purity requirements.

2. 5N level (99.999%)

Applications: Magnetron sputtering targets, superconducting joints, quantum devices.

Features: Impurities ≤ 10ppm, meeting the chip manufacturing requirements for processes below 7nm.

3. 6N level (99.9999%)

Applications: Extreme Ultraviolet (EUV) reflectors, nuclear physics detectors.

Features: Impurities ≤ 1ppm, used for ultra pure scenarios such as high-precision optical coating.

2、 Purity selection of magnetron sputtering process

Process below 7nm: requires 5N or 6N grade copper targets, with metal impurities controlled at ppb levels.

Key indicators: Gap elements (O, S, P) ≤ 5ppm, avoiding the formation of brittle phases that affect the quality of the film.

3、 Choose Suggestions

Industrial grade applications: 4N grade (such as nuclear reactor cladding materials).

High end semiconductor/optics: Priority is given to 5N-6N levels to ensure the conductivity and uniformity of sputtered films.