Preparation process of chromium sputtering target material!


Mix the metal chromium powder with a particle size of 60-320 mesh and a particle size of 320-500 mesh evenly, dry and set aside. The mass ratio of metal chromium powder with a particle size of 60-320 mesh to metal chromium powder with a particle size of 320-500 mesh is 5:3 and 9:2, respectively;

Add the mixed metal chromium powder into a cold press mold, and use a pressure of 700Mpa-100Mpa to cold press it into shape. Hold the pressure for 1s-120s and press it into a solid cylindrical chromium target material of the desired size;

Cover the surface of the chromium target material blank with wrapping paper, insert it into the hot pressing mold, and put it into the furnace;

Vacuumize to O-15pa, heat up to 300 ° C-400 ° C, hold for 10min -30min, continue heating up to 600 ° C-800 ° C, stop heating, start the hot pressing facility, preheat and press the upper and lower pressure heads of the positive hot pressing facility, and preheat and press the chromium target material billet at a pressure of 8MPa-12Mpa for 60s -90s; Turn off the hot pressing facility, continue to heat up to 1300 ° C-1600 ° C, and maintain the temperature for 30-120 minutes; Restart the hot pressing facility and use a pressure range of 20Mpa to 10Mpa to form the chromium target material. Maintain the pressure for 1 minute to 10 minutes, cool it down to 100 ° C, and then remove it from the furnace to obtain the chromium target material.

The preparation method is simple in process, easy to operate, environmentally friendly, and has a high product yield, achieving industrial production.