Hafnium target material

Hafnium (Hf) sputtering targets have been widely used in the thin film industry due to their high temperature resistance. They are mainly used for the deposition of hafnium based thin films in applica...
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Hafnium (Hf) sputtering targets have been widely used in the thin film industry due to their high temperature resistance. They are mainly used for the deposition of hafnium based thin films in applications such as integrated circuits and fiber optic cables. In addition, due to the high neutron absorption cross-section of hafnium, these target materials are also used to produce control rods for nuclear reactors.